|
2011
|
Castaños-Martínez E. and Moisan M.Expansion/Homogenization
of Contracted/Filamentary Microwave Discharges at
Atmospheric Pressure. IEEE Transaction
on Plasma Science, à paraître.
|
|
Levif P., Séguin J., Moisan M. and Barbeau J.
Influence of substrate materials on
inactivation of B. atrophaeus endospores in a reduced-pressure
argon plasma. Plasma
Processes and Polymers,
8
617-630. |
|
Poirier J.S., Bérubé P.M., Munoz J., Margot J., Stafford
L. and Chaker M. On
the validity of neutral gas temperature by N 2
rovibrational spectroscopy in low-pressure inductively
coupled plasmas.
Plasma Sources Science and Technology,
20
035016. |
|
Stafford L., Mattei S., Boudreault O., Khare R. and
Donnelly V.M.
Characterization of a low-pressure chlorine plasma
column sustained by propagating surface waves using
phase-sensitive microwave interferometry and trace-rare-gas
optical emission spectroscopy.
Journal of Applied Physics,
109
113304. |
|
Poaty B., Riedl
B., Blanchet P., Blanchard V. and Stafford L.
Improved water-repellence of black
spruce wood surfaces after treatment in carbon
tetrafluoride plasmas.
Wood Sci. Tecnol.,
soumis.
|
|
Levasseur O., Stafford L.,
Gherardi N., Naudé N., Blanchard V., Blanchet P. and
Riedl B. Formation of
superhydrophobic wood surfaces using atmospheric-pressure
dielectric barrier discharge in Helium-Hexamethyldisiloxane
gas mixtures. Plasma
Processes and Polymers
soumis.
|
|
Maaloul L., Morel S. and
Stafford L. Populations
of metastable and resonant argon atoms in rf magnetron
discharges used for deposition of indium-zinc-oxide film.
J. Vac. Sci. Technol. A,
soumis.
|
|
Boudreault O., Mattei S., Stafford
L., Margot J., Moisan M., Khare R. and Donnelly V.M.
Generation of suprathermal
electrons in low-pressure plasmas sustained by microwave
electromagnetic fields.
Phys. Rev. Lett. |
|
|
|
2010
|
Boudam M.K. and Moisan M., Synergy
effect of heat and UV photons on bacterial-spore
inactivation in an N2-O2 plasma sterilizer J.
Phys. D 43 295202. |
| Castaños-Martínez
E. and Moisan M.
Determination of metastable and resonant atom densities
through absorption spectroscopy at atmospheric pressure
using a low-pressure lamp as a spectral-line source
Spectrochimica Acta Part B: Atomic
Spectroscopy,
65 199-209 |
| Mahfoudh
A., Barbeau J., Moisan M., Leduc A., and Séguin J.
Biocidal action of ozone-treated
polystyrene surfaces on vegetative and sporulated
bacteria Applied Surface
Science,
256
3063-3072. |
| Mahfoudh
A., Moisan M., Séguin J., Barbeau J., Kabouzi Y., and
Kéroack D. Inactivation of
vegetative and sporulated bacteria by gaseous dry ozone
Ozone: Science & Engineering,
32,
180-198. |
| Mahfoudh
A., Poncin-Épaillard F., Moisan M., and Barbeau J.
Biocidal action of ozone-treated
polymer surfaces on sporulated bacteria
Surface Science
604
1487-1493. |
| Mahfoudh
A., Leduc A., Moisan M., Séguin J., and Barbeau J.
Biocidal properties of
ozone-treated polystyrene surfaces on sporulated
bacteria The Open
Microbiology Journal
accepté |
|
|
2009
|
Castanos-Martinez E, Moisan M and Kabouzi Y
Achieving
non-contracted and non-filamentary rare-gas tubular
discharges at atmospheric pressure
Journal
of Physics D-Applied Physics 42 012003. |
| Saussac
J, Margot J and Chaker M
Profile
evolution simulator for sputtering and ion-enhanced
chemical etching
Journal of Vacuum Science & Technology A 27
130-138. |
| Saussac
J, Margot J and Chaker M
Profile
evolution simulator for sputtering and ion-enhanced
chemical etching
Journal of Vacuum Science & Technology A 27
415-415. |
| Guha J,
Khare R, Stafford L, Donnelly V M, Sirard S and Hudson E
A
Effect of Cu contamination on recombination of O atoms
on a plasma-oxidized silicon surface
Journal of Applied Physics 105 113309-8. |
|
Stafford L, Khare R, Donnelly V M, Margot J and Moisan M
Electron energy distribution functions in low-pressure
oxygen plasma columns sustained by propagating surface
waves
Applied Physics Letters 94 021503. |
|
Stafford L, Khare R, Guha J, Donnelly V M, Poirier J S
and Margot J
Recombination of chlorine atoms on plasma-conditioned
stainless steel surfaces in the presence of adsorbed Cl2
Journal of Physics D-Applied Physics 42 055206 .
|
|
|
2008
|
Soltani M, Chaker M, Haddad E, Kruzelecky R, Margot J,
Laou P and Paradis S
Fabrication of stationary micro-optical shutter based on
semiconductor-to-metallic phase transition of W-doped VO2
active layer driven by an external voltage
J. Vacuum Science &
Technology A 26 763-767. |
|
Pollak J,
Moisan M, Kéroack D and Boudam M K
Low-temperature low-damage sterilization based on UV
radiation through plasma immersion
J. Phys. D. 41 135212. |
|
Kutasi K,
Saoudi B, Pintassilgo C D, Loureiro J and Moisan M
Modelling the low-pressure N2-O2
plasma afterglow to determine the kinetic mechanisms
controlling the UV emission intensity and its spatial
distribution for achieving an efficient sterilization
process
Plasma processes and polymers 5
10.1002. |
|
Guha J,
Kurunczi P, Stafford L, Donnelly V M, Pu Y K
In-situ
surface recombination measurements of oxygen atoms on
anodized aluminum in an oxygen plasma
Journal of Physical Chemistry C 112
8963-8968 |
|
Khanna R,
Stafford L, Voss L F, Pearton S J, Wang H T, Anderson T,
Hung S C, Ren F
Aging and
stability of GaN high electron mobility transistors and
light-emitting diodes with TiB2- and Ir-based
contacts
IEEE Transactions on Device and Materials Reliability
8 272-276 |
|
Stafford L,
Guha J, Donnelly V M
Recombination probability of oxygen atoms on dynamic
stainless steel surfaces in inductively coupled O2
plasmas
Journal of Vacuum Science & Technology A 26
455-461 |
|
Voss L F,
Stafford L, Gila B P, Pearton S J, Ren F
Ir-based
diffusion barriers for Ohmic contacts to p-GaN
Applied Surface Science 254 4134-4138 |
|
Pollak J, Moisan M, Kéroack D, Boudam M K
Low-temperature low-damage
sterilization based on UV radiation through plasma
immersion
J. Phys. D. 41
135212 |
|
Stafford L, Lim W T, Pearton S J,
Song J-I, Park J-S, Heo Y-W, Lee J-H, Kim J-J, Chicoine
M, Schiettekatte F
Deep etch-induced damage during
ion-assisted chemical etching of sputtered
indium-zinc-oxide films in Ar/CH4/H2
plasmas Thin Solid Films 516
2869-2873 |
|
Pollak J, Moisan M, Kéroack D, Séguin J, Barbeau J,
Plasma
sterilization within long and narrow-bore dielectric
tubes contaminated with stacked bacterial spores,
Plasma processes and polymers 5 14-25. |
|
|
2007
|
Stafford L, Voss L F, Pearton S J, Wang H T, Ren F
Improved long-term thermal
stability of InGaN/GaN multiple quantum well
light-emitting diodes using TiB2- and
Ir-based p-Ohmic contacts
Applied Physics Letters 90 242103. |
|
Khanna R, Gila B P, Stafford L, Pearton S J, Ren F,
Kravchenko I I
Ir-based schottky and ohmic contacts on n-GaN
Journal of the Electrochemical Society 154
H584-H588. |
|
Khanna R, Stafford L, Pearton S J, Anderson T J, Ren F,
Kravchenko I I, Dabiran A, Osinsky A, Lee J Y, Lee K Y,
Kim J Improved
long-term thermal stability at 350 degrees C of TiB2-based
ohmic contacts on AlGaN/GaN high electron mobility
transistors Journal of
Electronic Materials 36 379-383. |
|
Voss L F, Stafford L, Thaler G T, Abernathy C R, Pearton
S J, Chen J J, Ren F
Annealing and measurement
temperature dependence of W2B- and W2B5-based rectifying
contacts to p-GaN
Journal of Electronic Materials 36 384-390. |
|
Wright J S, Stafford L, Gila B P,
Norton D P, Pearton S J, Wang H T, Ren F
Effect of cryogenic temperature
deposition of various metal contacts on bulk
single-crystal n-type ZnO
Journal of Electronic Materials 36
488-493. |
|
Voss L F, Stafford L, Khanna R, Gila B P, Abernathy C R,
Pearton S J, Ren F, Kravchenko I I
Ohmic contacts to p-type GaN based
on TaN, TiN, and ZrN
Applied Physics Letters 90 212107. |
|
Khanna R, Gila B P, Stafford L, Pearton S J, Ren F,
Kravchenko I I, Dabiran A, Osinsky A
Thermal stability of ohmic
contacts to InN Applied
Physics Letters 90 162107. |
|
Lim W T, Stafford L, Sadik P W, Norton D P, Pearton S J,
Wang Y L, Ren F
Ni/Au ohmic contacts to p-type Mg-doped CuCrO2
epitaxial layers Applied
Physics Letters 90 142101. |
|
Khanna R, Stafford L, Pearton S J, Wang H T, Ren F,
Westermann R, Johnson D, Constantine C
Reduction of dry etch damage to
GaAs using pulse-time modulated plasmas
Electrochemical and Solid State Letters 10
H139-H141. |
|
Lim W T, Stafford L, Song J I, Park J S, Heo Y W, Lee J
H, Kim J J, Pearton S J
Dry etching of zinc-oxide and
indium-zinc-oxide in IBr and BI3 plasma
chemistries Applied
Surface Science 253 3773-3778. |
|
Wright J S, Khanna R, Stafford L,
Gila B P, Norton D P, Pearton S J, Ren F, Kravchenko I I
Ir/Au ohmic contacts on bulk, single-crystal n-type ZnO
Journal of the Electrochemical Society 154
H161-H165. |
|
Stafford L, Lim W T, Pearton S J, Chicoine M, Gujrathi
S, Schiettekatte F, Jae-Soung P, Ju-Il S, Young-Woo H,
Joon-Hyung L, Jeong-Joo K, Kravchenko I I
Influence of the film
properties on the plasma etching dynamics of
rf-sputtered indium zinc oxide layers
Journal of Vacuum Science & Technology A: Vacuum,
Surfaces, and Films 25 659-665. |
|
Lim W T, Stafford L, Wright J S, Vossa L F, Khanna R,
Song J-I, Park J-S, Heo Y W, Lee J-H, Kim J-J, Norton D
P, Pearton S J
Comparison of plasma chemistries for the dry etching of
bulk single-crystal zinc-oxide and rf-sputtered
indium-zinc-oxide films
Applied Surface Science 253 9228-9233. |
|
Voss L F, Stafford L, Wright J S,
Pearton S J, Ren F, Kravchenko I I
W2B and CrB2
diffusion barriers for Ni/Au contacts to p-GaN
Applied Physics Letters 91 042105. |
|
Soltani M, Chaker M, Haddad E, Kruzelecky R, Margot J,
Micro-optical switch device based on
semiconductor-to-metallic phase transition
characteristics of W-doped VO2 smart coatings,
J. Vac. Sci. Technol. A, 25, 971-975. |
|
Stafford L, Margot J, Delprat S, Chaker M, Pearton S J,
Influence of redeposition on the plasma etching dynamics,
J. Appl. Phys., 101, 083303. |
|
Stafford L, Langlois O, Margot J, Chaker M,
Influence of the positive ion composition on the
ion-assisted chemical etch yield of SrTiO3
films in Ar/SF6
plasmas,
J. Vac. Sci. Technol. A 25, 425-431. |
|
Boudam M K, Saoudi B, Moisan M, Ricard A,
Characterization of the flowing afterglows of an N2-O2
reduced-pressure discharge: setting the operating
conditions to achieve a dominant late-afterglow and
correlating the NOb UV intensity variation
with the N and O atom densities,
J. Phys. D 40, 1694-1711. |
|
Fleisch T, Kabouzi Y, Pollack J, Castaños-Martínez E,
Nowakowska H, Moisan M,
Designing
an efficient microwave-plasma source, independent of
oerating conditions, at atmospheric pressure,
Plasma Sources Science and Technology 16
173-182. |
|
Kabouzi Y, Graves D, Castaños-Martínez E, Moisan M,
Modeling of atmospheric-pressure plasma columns
sustained by surface waves,
Phys. Rev E 75
016402-1-13. |
|
Pollak J, Moisan M, Zakrzewski Z,
Long and
uniform plasma columns generated by linear
field-applicators based on stripline technology,
Plasma Sources Science and Tehnology 16,
310-323. |
|
Pollak J, Moisan M, Zakrzewski Z, Pelletier J, Arnal Y
A, Lacoste A, Lagarde T,
Compact
waveguide-based power divider feeding independently any
number of coaxial lines,
IEEE Trans. Microwave Theory Techniques
55, 951-957. |
|
|
2006
|
Park J S, Song J I, Heo Y W, Lee J H, Kim J J, Lim W T,
Stafford L, Norton D P, Pearton S J
Effects of Zn content on
structural and transparent conducting properties of
indium-zinc oxide films grown by rf magnetron sputtering
Journal of Vacuum Science & Technology B 24
2737-2740. |
|
Lim W T, Stafford L, Song J I, Park J S, Heo Y W, Lee J
H, Kim J J, Pearton S J
High-density plasma etching of
indium-zinc oxide films in Ar/Cl-2
and Ar/CH4/H-2
chemistries Applied
Surface Science 253 2752-2757. |
|
Stafford L, Voss L F, Pearton S J, Chen J J, Ren F
Schottky barrier height of
boride-based rectifying contacts to p-GaN
Applied Physics Letters 89 132110. |
|
Wang H T, Jang S, Anderson T, Chen J J, Kang B S, Ren F,
Voss L F, Stafford L, Khanna R, Gila B P, Pearton S J,
Shen H, LaRoche J R, Smith K V
Increased Schottky barrier
heights for Au on n- and p-type GaN using cryogenic
metal deposition Applied
Physics Letters 89 122106. |
|
Stafford
L, Pearton S J, Margot J,
Influence of ion mixing on the energy dependence of the
ion-assisted chemical etch rate in reactive plasmas,
J. Appl. Phys. 100, 063309-1/5 |
|
Nowakowska
H, Jasinski M, Mizeraczyk J, Zakrzewski Z, Kabouzi Y,
Castanos-Martinez E, Moisan M
Surface-wave sustained discharge in neon at atmospheric
pressure: model and experimental verification
Czechoslovak Journal of Physics 56 B964-B970. |
|
Soltani M,
Chaker M, Jiang X X, Nikanpour D, Margot J
Thermochromic La1-xSrxMnO3
(x=0.1, 0.175, and 0.3) smart coatings grown by reactive
pulsed laser deposition
Journal of Vacuum Science & Technology A 24
1518-1523. |
|
Riabinina
D, Durand C, Margot J, Chaker M, Botton G A, Rosei F
Nucleation
and growth of Si nanocrystals in an amorphous SiO2
matrix
Physical Review B
74 075334. |
|
Nantel-Valiquette M, Kabouzi Y, Castanos-Martinez E,
Makasheva K, Moisan M, Rostaing J C
Reduction of perfluorinated compound emissions using
atmospheric pressure microwave plasmas: Mechanisms and
energy efficiency
Pure and Applied Chemistry 78
1173-1185. |
|
Boudam M K,
Moisan M, Saoudi B, Popovici C, Gherardi N, Massines F
Bacterial
spore inactivation by atmospheric pressure plasmas in
the presence or absence of UV photons as obtained with
the same gas mixture
J. Phys. D: Appl. Phys. 39 3494-3507. |
|
haut de
page |
|
|
2005
|
O. Barthélemy, J. Margot, M. Chaker, M. Sabsabi, F.
Vidal, T. W. Johnston, S. Laville, B. Le Drogoff,
Influence of the laser parameters on the space and time
characteristics of an aluminum laser-induced plasma,
Spectrochim. Acta B,
60 (7-8), 905-914 |
|
O. Langlois, L. Stafford, J. Margot, M. Chaker,
Ion mass dependence of the etch yield in reactive
plasmas,
Appl. Phys. Lett., 87, 131503/1-3 |
|
L. Stafford, J. Margot, F. Vidal, M. Chaker, K. Giroux,
J.-S. Poirier, A. Quintal-Léonard, J. Saussac,
Investigation of the kinetics driving chlorine
high-density plasmas,
J. Appl. Phys., 98, 063301/1-11 |
|
L. Stafford, J. Margot, M. Chaker, S. J. Pearton,
Energy dependence of ion-assisted chemical etching in
reactive plasmas,
Appl. Phys. Lett.
87, 071502/1-3 |
|
L.
Stafford, J. Margot,
Comment on "Plasma etching of high dielectric constant
materials on silicon in halogen chemistries" by L. Sha
and J.P. Chang in JVST A 22, 88,
J. Vac. Sci. Technol. A 23, 720-721 |
|
A. Sáinz, J. Margot, M. C. García, M. D. Calzada,
Role of dissociative recombination in the excitation
kinetics of an argon microwave plasma at atmospheric
pressure,
J. Appl. Phys. 97, 113305-113315 |
|
M. Gaidi, L. Stafford, J. Margot, M. Chaker, R.
Morandotti, M. Kulishov,
Microfabricated SrTiO3 ridge waveguides,
Appl. Phys. Lett. 86, 221106-221108 |
|
O.
Barthélemy,
J.
Margot,
S. Laville, F. Vidal, M. Chaker, B. Le Drogoff, T.W.
Johnston, M. Sabsabi.,
Investigation of the state of local thermodynamic
equilibrium of a laser-produced aluminum plasma at low
fluence,
Appl. Spec. 59, 529-536 |
|
O. Barthélemy, J. Margot, M. Chaker,
Characterization of the Expansion of an Aluminum
Laser-Induced Plasma at Low Fluence in Ambient Air by
Fast Photography,
IEEE Trans. Plasma Sci. 33, 476-477 |
|
M. Gaidi, L. Stafford, A. Amassian, M. Chaker, J.
Margot, M. Martinu, M. Kulishov,
Influence of the microstructure on the optical
characteristics of SrTiO3 thin films,
J. Mat. Res. 20, 68-74 |
|
B. Le Drogoff, F. Vidal, M. Chaker, T.W. Johnston,
S. Laville, O. Barthélemy, J. Margot, M. Sabsabi,
Laser-ablated volume and depth as a function of pulse
duration in aluminum targets,
Applied Optics 44, 278-281 |
|
M. Gaidi,
L. Stafford, A. Amassian, M. Chaker, J. Margot, M.
Martinu, M. Kulishov,
Influence of the microstructural properties of SrTiO3
thin films on their optical characteristics,
J. Mat. Res. 20 68-74 |
|
Y. Kabouzi,
M. Moisan
Pulsed microwave discharges sustained at atmospheric
pressure: study of the contraction and filamentation
phenomena,
IEEE Transaction on Plasma Science 33,
292-293. |
|
haut de
page |
|
|
2004
E. Castaños-Martinez, Y. Kabouzi, K. Makasheva, M.
Moisan
Modeling of microwave-sustained plasmas at
atmospheric pressure with application to discharge
contraction,
Physical Review E 70, 066405-1.
|
|
M.
Christova, E. Castaños-Martinez, M.D. Calzada, Y.
Kabouzi, J.M. Luque, M. Moisan
Electron density and gas temperature from line
broadening in an argon surface-wave-sustained discharge
at atmospheric pressure,
Applied Spectroscopy 58, 1032-1037. |
|
M. Soltani,
M. Chaker, E. Haddad, R.V. Kruzelecky, J. Margot,
Effects of Ti-W co-doping on the optical and electrical
switching of vanadium dioxide thin films grown by a
reactive pulsed laser deposition,
Appl. Phys. Lett. 89, 1958-1960 |
|
L.
Stafford, M. Gaidi, M. Chaker, O. Langlois, J. Margot,
F. Schiettekatte, P. Wei,
Influence of the microstructure on the sputter-etching
characteristics of strontium-titanate-oxide thin films,
Appl. Phys. Lett. 84, 2473-2706 |
|
S. Laville,
F. Vidal, T.W. Johnston, M. Chaker, B. LeDrogoff, O.
Barthélemy, J. Margot, M. Sabsabi,
Modeling of laser-induced plasmas for various pulse
duration and laser fluences,
Phys. Plasmas 11, 2182-2190
|
|
B. Le
Drogoff, M. Chaker, J. Margot, M. Sabsabi, O.
Barthélemy, T.W. Johnston, S. Laville,, F. Vidal
Influence of the laser pulse duration on spectrochemical
analysis of solids by LIPS,
Appl. Spec. 58, 122-129 |
|
B. Le
Drogoff, F. Vidal, M. Chaker, T.W. Johnston, S. Laville,
O. Barthélemy, J. Margot, M. Sabsabi,
Laser ablated volume and depth as a function of the
pulse duration in aluminum targets,
Applied Optics 58, 122-129 |
|
haut de
page |
|
|
2003
|
Y. Kabouzi, M. Moisan, J. C. Rostaing, C. Trassy, D.
Guérin, D. Kéroack, Z. Zakrzewski
Abatement of perfluorinated compounds using microwave
plasmas at atmospheric pressure,
J. Appl. Phys.
93, 9483-9496.
|
|
H. Nowakowska, Z. Zakrzewski, M. Moisan
Propagation of electromagnetic waves along an annular
plasma column,
High Temperature Material Processes 7,
155-161.
|
|
L.
Stafford, J. Margot, O. Langlois, M. Chaker,
Barium-strontium titanate etching in chlorinated
discharges,
J. Vac. Sci. Technol. A. 21, 1247-1252. |
|
L.
Stafford, J. Margot, M. Chaker, O. Pauna,
Characterization of neutral, positive, and negative
species in a chlorine high-density surface-wave plasma,
J. Appl. Phys. 90, 1907-1913. |
|
haut de
page |
|
|
2002
|
S. Laville,
F. Vidal, TW. Johnston, O. Barthelemy, M. Chaker, B. Le
Drogoff, J. Margot, M. Sabsabi,
Fluid modeling of the laser ablation depth as a function
of the pulse duration for conductors,
Phys. Rev. E 66, 6415-22. |
|
Y. Kabouzi,
M. D. Calzada, M. Moisan, K. C. Tran, C. Trassy
Radial contraction of microwave-sustained plasma columns
at atmospheric pressure,
J. Applied Physics 91, 1008-1019.
|
|
N.
Philip, B. Saoudi, M. C. Crevier, M. Moisan, J. Barbeau,
J. Pelletier
The respective roles of UV photons and oxygen atoms in
plasma sterilization at reduced gas pressure : the case
of N2-O2
mixtures,
IEEE Transaction on Plasma Science
30, 1429-1436.
|
|
M. Moisan, J. Barbeau, M.-C. Crevier, J. Pelletier, N.
Philip, B. Saoudi,
Plasma sterilization: methods and mechanisms,
Numéro spécial (15th
international symposium on plasma chemistry (ISPC-15))
de Pure and Applied Chemistry (IUPAC),
74, 349-358. |
|
L.
Stafford, J. Margot, S. Delprat, M. Chaker, D. Queney
Sputter-etching characteristics of
barium-trontium-titanate and bismuth-strontium-tantalate
using a surface-wave high-density plasma,
J. Vac, Sci. Technol. A 20, 530-535l.
|
|
M. Moisan,
J. Barbeau, J. Pelletier, B. Saoudi
La stérilisation par plasma froid à pression très
inférieure à la pression atmosphérique,
Le Vide : science, technique et applications
303, 71-84. |
|
haut de
page |
|
|
2001
|
L.
Stafford, J. Margot, T.W. Johnston,
Propagation of surface waves in two-plasma systems
bounded by a metallic enclosure,
J. Plasma Physics 66, 349-362.
|
|
J. Stanco,
H. Nowakowska, Z. Zakrzewski, M. Moisan
Modeling microwave discharge plasmas at atmospheric
pressure : results and perspectives,
High Temperature Material Processes 5,
265-275. |
|
J.
Margot, F. Vidal, M. Chaker, T.W. Johnston, A.
Aliouchouche, M. Tabbal, S. Delprat, O. Pauna, D.
Benhabid
Sustaining power per electron for a large low-pressure
argon magnetoplasma reactor: experiment and isothermal
model results,
Plasma Sources Sci. Technol. 10 (4),
556-566
|
|
M..
Moisan, J. Barbeau, S. Moreau, J. Pelletier, M.
Tabrizian, L’H. Yahia,
Low-temperature sterilization using gas plasmas : a
review of the experiments and an analysis of the
inactivation mechanisms,
International Journal of Pharmaceutics 226,
1-21
|
|
Y. Kabouzi,
M. D. Calzada, M. Moisan, C. Trassy
Gas temperature in contracted atmospheric pressure
discharges sustained in cylindrical tubes by microwaves
at 2450 MHz,
Progress in Plasma Processing 69-74 |
|
A. Ricard,
M. Moisan, S. Moreau,
Détermination de la concentration d’oxygène atomique par
titrage avec NO dans une post-décharge en flux, émanant
de plasmas de Ar-O2 et N2-O2,
utilisée pour la stérilisation,
J. Phys. D : Appl. Phys. 34, 1203-1212 |
|
M. Moisan,
J. Barbeau, J. Pelletier
La stérilisation par plasma : méthodes et mécanismes,
Le Vide : science, technique et applications
299, 15-28
|
|
M. Moisan,
Z. Zakrzewski, J.C. Rostaing,
Waveguide-based single and multiple nozzle plasma
torches: the TIAGO concept,
Plasma sources science and technology 10,
387-394 |
|
C.
Campillo, S. Ilias, C. F. M. Borges, M. Moisan, L.
Martinu
Enhanced diamond film adhesion on cobalt-cemented WC
substrates,
New diamond and frontier carbon technology 11,
147-155
|
|
H. Nowakowska, Z. Zakrzewski, M. Moisan
Propagation characteristics of electromagnetic waves
along a dense plasma filament,
J. Phys.
D : Appl.
Phys. 34, 1474-1478 |
|
F.
Vidal, S. Laville, T.W. Johnston, O. Barthélemy, M.
Chaker, B. Le Drogoff, J. Margot, M. Sabsabi
Numerical Simulations of Ultrashort Laser Pulse Ablation,
Spectrochimica Acta B 56 (6), 973-986 |
|
B. Le
Drogoff, J. Margot, M. Chaker, M. Sabsabi, O.
Barthélemy, T.W. Johnston, S. Laville, F. Vidal, Y. von
Kaene
Temporal characterization of femtosecond laser pulses
induced plasma for spectrochemical analysis of aluminum
alloys,
Spectrochimica Acta 56 (6), 987-1002
|
|
B. Le
Drogoff, F. Vidal, Y Von Kaenel, M. Chaker, M. Sabsabi,
T.W. Johnston, S. Laville, J. Margot
Ultrashort pulses laser plasma thresholds and ablated
mass of aluminum,
J. Appl. Phys. 89, 8247-8252 |
|
J.
Margot
Studies of emission spectra in helium plasmas at
atmospheric pressure and local thermodynamical
equilibrium,
Phys. Plasmas 8, 2525-2531 |
|
F. Vidal,
T.W. Johnston, S. Laville, O. Barthelemy, M. Chaker, B.
Ledrogoff, J. Margot, M. Sabsabi
Critical-point phase separation in laser ablation of
conductors,
Phys. Rev. Lett. 86, 2573-2576
|
|
Times New Roman
; mso-fareast-font-family: Times New Roman
;mso-ansi-language:EN-US;mso-fareast-language:
FR;mso-bidi-language:AR-SA">S.
Delprat, M. Chaker, J. Margot
Investigation of the gas pressure influence on patterned
platinum etching characteristics using a high-density
plasma,
J. Appl. Phys. 89, 29-33 |
|
haut de
page |
|
|
2000
|
G.M.
Petrov, J.P. Matte, I. Pérès, J. Margot, T. Sadi, J.
Hubert, K.C. Tran, L.L. Alves, J. Loureiro, C.M.
Ferreira, V. Guerra, G. Gousset
Numerical modelling of a He-N2 capillary
glow discharge at atmospheric pressures ,
Plasma Chem. Plasma Proc. 20, 183-207 |
|
L. St-Onge,
M. Chaker, J. Margot
Laser-induced photodetachment in high-density
low-pressure SF6
magnetoplasmas,
J. Vac. Sci. Technol. A 18, 2363-2371
|
|
S. Ilias,
C. Campillo, C. F. M. Borges, M. Moisan
Diamond coatings deposited on tool materials with a 915
MHz scaled-up surface-wave-sustained plasma,
Diamond and Related Materials 9, 1120-1124
|
|
A. C.
Fozza, M. Moisan, M. R. Wertheimer
Vacuum ultraviolet to visible emission from hydrogen
plasma: effect of excitation frequency,
J. Appl. Phys. 88, 20-33 |
|
J. C.
Rostaing, F. Bryselbout, M. Moisan, J. C. Parent
Méthode d'épuration des gaz rares au moyen de décharges
électriques de haute fréquence,
C. R. Acad. Sci. Paris, t. 1, Série IV, 99-105 |
|
S. Moreau,
M. Moisan, M. Tabrizian, J. Barbeau, J. Pelletier, A.
Ricard, L'H. Yahia
Using the flowing aterglow of a plasma to inactivate Bacillus
subtilis spores: influence of the operating
conditions,
J. Appl. Phys. 88, 1166-1174 |
|
haut de
page |
|
|
1999
|
I. Pérès,
L.L. Alves, J. Margot, T. Sadi, C.M. Ferreira, K.C.
Tran, J. Hubert, Plasma Chem. Plasma Proc., 19,
467 |
|
F. Vidal,
T.W. Johnston, J. Margot, M. Chaker, O. Pauna,
Diffusion
modeling of an HF argon plasma discharge in a magnetic
field,
IEEE Trans. Plasma Sci. 27, 727-745 |
|
S. Delprat,
M. Chaker, J. Margot,
Patterned
platinum etching studies in an argon high-density plasma,
Jpn. J. Appl. Phys. 38, 4488-4491
|
|
M. Moisan
Introduction aux décharges entretenues par des champs de
hautes fréquences (HF),
Belvac News (Société Belge de vacuologie), 15,
Nr. 1, 10-36 et Nr. 2, 15-31 |
|
Z.
Zakrzewski, J. Sta_co, M. Moisan
Modeling of atmospheric pressure microwave sustained
discharges,
Advanced technologies based on wave and beam generated
plasmas, NATO Science Series,
High Technology 67, 343-352 |
|
Z.
Zakrzewski, M. Moisan
Atmospheric pressure discharges: traveling wave plasma
sources,
Advanced technologies based on wave and beam generated
plasmas, NATO Science Series, High Technology
67, 335-342 |
|
Z.
Zakrzewski, M. Moisan
Long microwave discharges,
Advanced technologies based on wave and beam generated
plasmas, NATO Science Series,
High Technology,67, 353-365 |
|
M. Moisan,
J. Hubert, J. Margot, Z. Zakrzewski
The development and use of surface-wave discharges for
applications,
Advanced technologies based on wave and beam generated
plasmas, NATO Science Series, High Technology
67, 23-64 |
|
haut de
page |
|
|
1998
|
P. Mérel,
M. Tabbal, M. Chaker, S. Moisa, J. Margot
Direct evaluation of sp3
content in diamond-like-carbon films by XPS,
Appl. Surf. Sci.
5433 |
|
L. St-Onge,
J. Margot, M. Chaker
Experimental investigation of a large volume SF6
magnetoplasma source based on surface-wave propagation,
Plasma Sources Sci. Technol., 7, 154-161 |
|
L. St-Onge,
J. Margot, M. Chaker
Characterization of the negative ion fraction in
high-density SF6 magnetoplasmas using ion
acoustic waves,
Appl. Phys. Lett. 72, 290-292
|
|
P. Mérel,
M. Tabbal, M. Chaker, M. Moisan, A. Ricard
Influence of the field frequency on the nitrogen atom
yield in the remote plasma of an N2
high frequency discharge,
Plasma Sources Science and Technology 7,
550-556 |
|
S. Schelz,
C. Campillo, M. Moisan, Characterization of diamond
films deposited with a 915 MHz scaled-up
surface-wave-sustained plasma,
Diamond Rel. Materials 7, 1675-1683 |
|
H.
Nowakowska, Z. Zakrzewski, M. Moisan, M. Lubanski
Propagation characteristics of surface waves sustaining
atmospheric pressure discharges: the influence of the
discharges processes,
J. Phys. D: Appl. Phys. 31, 1422-1432 |
|
M. Moisan,
Z. Zakrzewski, R. Etemadi, J.C. Rostaing
Multitube surface-wave discharges for increased gas
throughput at atmospheric pressure,
J. Appl. Phys. 83, 5691-5701 |
|
S. Schelz,
L. Martinu, M. Moisan, Diamond nucleation enhancement by
pretreating the silicon substrate with a fluorocarbon
plasma,
Diamond and Related Materials 7, 1291-1302 |
|
F.
Bounasri, J. Pelletier, M. Moisan, M. Chaker
Surface diffusion model accounting for the temperature
dependence of tungsten etching characteristics in a SF6
magnetoplasma,
J. Vac. Sci. Technol. B 16, 1068-1076 |
|
M. Tabbal,
P. Mérel, S. Moisa, M. Chaker, E. Gat, A. Ricard, M.
Moisan, S. Gujrathi
XPS and FTIR analysis of nitrogen incorporation in CNx
thin films,
Surface Coatings Technol. 98, 1092-1096
|
|
haut de
page |
|
|
1997
|
J. Margot,
M. Chaker, L. St-Onge, M. Tabbal, O. Pauna, C. Alinot,
C. Kliagine
High frequency magnetoplasmas in electronegative gases,
J. Physique IV 7, 295-305 |
|
I. Pérès,
A. Dallaire, P. Jones, J. Margot. Dependence of the
emission characteristics of magnetized sur-face-wave
plasmas on the azimuthal configuration of the wave
field, J. Appl. Phys.
82, 4211-4218 |
|
P. Mérel,
M. Chaker, M. Tabbal, M. Moisan
The influence of atomic nitrogen flux on the composition
of carbon nitride thin films,
Appl. Phys. Lett. 71, 3814-3816 |
|
S. Schelz,
C. F. M. Borges, L. Martinu, M. Moisan
Chemical vapour deposition of diamond films on
hydrofluoric acid etched silicon substrates,
J. Vac. Sci. Technol. A 15, 2743-49 |
|
V.
T-Airoldi, C. F. M. Borges, M. Moisan, D. Guay
High optical transparency and good adhesion of diamond
films deposited on fused silica windows with a
surface-wave sustained plasma,
Applied Optics 106, 4400-4402 |
|
haut de
page |
|
|
1996
|
I. Pérès,
J. Margot. The power balance of a magnetically confined
surface wave plasma column, Plasma Sources Sci.
Technol. 5, 653-661 |
|
I. Pérès,
M. Fortin, J. Margot
The radial structure of a magnetically confined
surface-wave plasma column,
Phys. Plasmas
3, 1754-1769 |
|
J. Hubert,
S. Bordeleau, K.C. Tran, S. Michaud, B. Milette, R.
Sing, J. Jalbert, D. Boudreau, M. Moisan, J. Margot
Atomic spectroscopy with surface wave plasmas,
Fres. J. Anal. Chem. 355, 494-500 |
|
E. Gat, F.
Bounasri, M. Chaker, M.F. Ravet, M. Moisan, J. Margot
Temperature effects on tungsten etching,
Microelec. Eng.
30, 337-340
|
|
M. Tabbal,
P. Mérel, S. Moisa, M. Chaker, A. Ricard, M. Moisan
X-ray photoelectron spectroscopy of carbon nitride films
deposited by graphite laser ablation in a nitrogen
postdischarge,
Appl. Phys. Lett. 69, 1698-1700 |
|
J. Arnó, J.
Bevan, M. Moisan, Detoxification of trichloroethylene in
a low-pressure surface wave plasma reactor,
Environmental Science and Technology 30,
2427-2431 |
|
C. F. M.
Borges, V. T. Airoldi, E. J. Corat, M. Moisan, S.
Schelz, D. Guay
Very low roughness diamond film deposition using a
surface-wave sustained plasma,
J. Appl. Phys. 80, 6013-6020
|
|
C. F. M.
Borges, S. Schelz, L. Martinu, M. Moisan
Adhesion of CVD diamond films on silicon substrates of
different crystallographic orientations,
Diamond and Relat. Materials 5, 1402-1406
|
|
C. F. M.
Borges, S. Schelz, L. St-Onge, M. Moisan, L. Martinu
Silicon contamination of diamond films deposited on Si
substrates in fused silica based reactors,
J. Appl. Phys. 79, 3290-3298
|
|
M. D.
Calzada, M. Moisan, A. Gamero, A. Sola
Experimental investigation and characterization of the
departure from local thermodynamic equilibrium along a
surface wave-sustained discharge at atmospheric pressure,
J. Appl. Phys. 80, 46-55
|
|
C. F. M.
Borges, L. St-Onge, M. Moisan, A. Gicquel
Influence of process parameters on diamond film CVD in a
surface-wave driven microwave plasma reactor,
Thin Solid Films 274, 3-17. |
|
haut de
page |
|
|
1995
|
F.
Bounasri, E. Gat, M. Chaker, M. Moisan, J. Margot, M.F.
Ravet
High anisotropic etching of submicrometer features on
tungsten,
J. Appl. Phys.
78, 6780-6783 |
|
L. St-Onge,
N. Sadeghi, J.P. Booth, J. Margot, C. Barbeau
On the formation and loss of S2 molecules in
a RIE reactor operating with SF6,
J. Appl. Phys. 78, 6957-6966
|
|
J Margot,
M. Moisan, M. Fortin
The power required to maintain an electron in a
discharge: its use as a reference parameter in
magnetized high frequency plasmas,
J. Vac. Sci. B A13, 2890-2899
|
|
F.
Bounasri, M. Moisan, L. St-Onge, J. Margot, M. Chaker,
J. Pelletier, A. El Khakani, E. Gat.
Etch characterization of a large diameter ECR process
reactor supplied by a surface-wave-sustained plasma
source,
J. Appl. Phys. 77, 4030-4038 |
|
F.
Bounasri, E. Gat, M. Chaker, M. Moisan, J. Margot, M. F.
Ravet
Highly anisotropic etching of submicrometer features on
tungsten without external biasing,
J. Appl. Phys. 78, 6780-83 |
|
J. Margot,
M. Moisan, M. Fortin,
The power required to maintain an electron in the
discharge: its use as a reference parameter in
magnetized HF plasmas,
J. Vac. Sci. Technol. A 13, 2890-2899
|
|
C. F. M.
Borges, M. Moisan, A. Gicquel
A novel technique for diamond film deposition using
surface-wave discharges,
Diamond and Relat. Materials 4, 149-154 |
|
A. Ricard,
L. St-Onge, H. Malvos, A. Gicquel, J. Hubert, M. Moisan
Torche à plasma à excitation micro-onde: deux
configurations complémentaires,
Journal de physique III 5, 1269-1285
|
|
F.
Bounasri, M. Moisan, L. St-Onge, J. Margot, M. Chaker,
J. Pelletier, M. A. El Khakani, E. Gat
Etching characteristics of thin films of tungsten,
amorphous silicon carbide and resist submitted to a
surface-wave driven magnetoplasma near ECR conditions,
J. Appl. Phys. 77, 4030-4038 |
|
Z.
Zakrzewski, M. Moisan
Plasma sources using long linear microwave field
applicators: main features, classification and modeling,
Plasma Sources Science and Technology 4,
379-397 |
|
M. Moisan,
Z. Zakrzewski, R. Grenier, G. Sauvé
Large diameter plasma generation using a waveguide-based
field applicator at 2.45 GHz,
J. Microw. Power Electromagnetic Energy 30,
58-65 |
|
J. Arnó, J.
Bevan, M. Moisan, Acetone conversion in a low pressure
oxygen surface-wave plasma,
Environmental Science and Technology 29,
1961-65 |
|
M. Moisan,
R. Grenier, Z. Zakrzewski
The electromagnetic performance of a surfatron-based
coaxial microwave plasma torch,
Spectrochimica Acta 50B, 781-789 |
|
G. Sauvé,
M. Moisan, Z. Zakrzewski, C. A. Bishop
Long linear uniform plasmas sustained by microwaves
using a leaky-wave field applicator,
IEEE Trans. Ant. Propag. 43, 248-256. |
|
haut de
page |
|
|
Brevets
|
Z.
Zakrzewski, T. Fleisch, J. Pollak, M. Moisan, D. Guérin,
M. Jasinski, D. Czylkowski, C. Larquet, A.L. Lesort,
J.-C. Rostaing,
Système de
couplage micro ondes - plasma et son application à la
destruction sélective de molécules chimiques
demande EP 08305208.4 déposée le 28 mai 2008 au nom de
l’Air Liquide. |
|
M. Moisan,
D. Guérin, C. Larquet, J.-C. Rostaing, P. Moine, B.
Depert, V. Laurent,
Procédé de
refroidissement d'un plasma micro-onde et système de
destruction sélective de molécules chimiques utilisant
ce procédé
demande EP 08305206.8 déposée le 28 mai 2008 au nom de
l’Air Liquide. |
|
M. Moisan,
D. Guérin, C. Larquet, J.-C. Rostaing, A.L. Lesort, A.
El-Krid, H. Dulphy, P. Moine, B. Depert, V. Laurent, E.
Sandre,
System for
the destruction of PFC molecules using an aluminum
nitride comprising dielectric tube
demande EP 08305205.0 déposée le 28 mai 2008 au nom de
l’Air Liquide |
|
Z.
Zakrzewski, M. Moisan, D. Guérin, J.C. Rostaing,
Dispositifs générateurs de plasmas micro-ondes et
torches à plasma,
demande de brevet déposée en France FR - 07 57719 le 20
septembre 2007 au nom de l'Air Liquide. |
|
J. Pollak,
M. Moisan
Appareil et procédé d'inactivation et/ou stérilisation
par plasma,
demande de brevet américain déposée le 11 janvier
2007 au nom d l’Université de Montréal. |
|
D. Guérin,
C. Larquet, A. El-Krid, J.-C. Rostaing, M. Moisan,
Procédé de traitement plar plasma d'effluents gazeux,
Demande PCT FR/050699. |
|
Y. Kabouzi,
M. Moisan, J. C. Rostaing, D. Guérin, H. Dulphy, P.
Moine, V. Laurent, B. Depert
Traitement d’effluents gazeux par plasma à pression
atmosphérique,
brevet français FR 2873045 (déposé le 13/07/04), au nom
de L’Air Liquide. |
|
H. E.
Dulphy, P. Moine, V. Laurent, B. Depert, Y. Kabouzi, M.
Moisan, J. C. Rostaing
Procédé et appareil d’uniformisation de la pression des
gaz injectés dans un plasma,
demande de brevet français numéro 05 52063 (06/07/05),
déposée au nom de L’Air Liquide. |
|
D. Guérin,
J. C. Rostaing, C. Larquet, M. Moisan, Z. Zakrzewski, D.
Czyskowski, M. Jasinski
Excitateurs de plasma micro-ondes,
demande de brevet français numéro 04 53166 (23/12/04),
déposée au nom de L’Air Liquide. |
|
M. Moisan,
J. C. Rostaing, M. Carré, K. C. Tran
Procédé de traitement des gaz par des décharges hautes
fréquences,
demande de brevet français numéro 04 50016 (06/01/04),
déposée au nom de L’Air Liquide. Demande PCT publié le
18 août 2005 sous le numéro WO2005075058 |
|
J. Pollak,
M. Moisan, B. Saoudi, Z. Zakrzewski
Procédé de stérilisation par plasma d'objets de nature
diélectrique et comportant une partie creuse,
dépôt provisoire canadien numéro 2,412,997 en date du 24
mars 2003, au nom de l'Université de Montréal. Demande
PCT (01/12/2003), publié le 17 juin 2004 sous le numéro
WO2004/050128, demande de brevet américain
US2005/0269199 A1. |
|
M. Moisan,
N. Philip, B. Saoudi, Système
et procédé de haute performance pour la stérilisation
par plasma gazeux à basse température,
dépôt provisoire canadien 2,395,659 le 26 juillet 2002.
Demande de PCT déposée. Demande de PCT déposée le 24
juillet 2003. |
|
M. Moisan,
S. Moreau, M. Tabrizian, J. Pelletier, J. Barbeau,
L’H.Yahia,
Procédé de stérilisation d’objets par plasma,
demande de brevet canadien 2 273 432 (mai 99) par
l’Université de Montréal. Demande internationale dite de
PCT accueillie le 12 juin 2001. |
|
C. F. M.
Borges, M. Moisan, F. Roy
Method for producing a high adhesion thin film of
diamond on a Fe-based substrate,
brevet américain 5,759,623. |
|
7 autres
brevets pris par Air Liquide (» 50 pays). |
|
M. Moisan,
Z. Zakrzewski, D. Kéroack, J-C. Rostaing
Dispositif de traitement de gaz par plasma,
demande de brevet français numéro 00 13840 du 27 octobre
2000. |
|
haut de
page |
|
|
Livre
|
|
Chapitres tirés de volume
|
Advanced
technologies based on wave and beam generated plasmas
(NATO ASI series) (Kluwer, 1999): |
|
M. Moisan,
J. Hubert, J. Margot, Z. Zakrzewski
The development and use of surface-wave discharges for
applications,
pp. 23-64. Aussi, (L2) Z. Zakrzewski, M. Moisan
Atmospheric pressure discharges : traveling wave plasma
sources,
pp. 335-342; (L3) Z. Zakrzewski, J. Stanco, M. Moisan,
Modeling of atmospheric pressure discharges, pp.
343-352; Z. Zakrzewski, M. Moisan
Long microwave discharges,
pp. 353-365 |
|
Plasma processing of polymers
(NATO ASI Series) (Kluwer, 1997):
|
|
M. R. Wertheimer, M. Moisan, L. Martinu
Microwave and dual-frequency plasma processing,
pp. 101-127 |
|
Plasma processing of semiconductors
(NATO ASI Series) (Kluwer, 1997): |
|
J. Margot, M. Moisan
Physics of surface-wave discharges,
pp. 187-210. Autre chapitre
Magnetized surface-wave discharges,
pp. 491-513 |
|
M. Moisan,
J. Margot, Z. Zakrzewski
Surface-wave plasma sources,
chapitre 5 de
High
density plasma sources,
(Noyes, 1995), pp. 191-250 |
|
haut de page |
|
|
Conférences sur invitation
|
L. Stafford, S. Mattei, O.
Boudreault, R. Khare, V.M. Donnelly,
Experimental and modeling study of
recombination reactions on dynamic surfaces in
low-pressure plasmas, 19th
International Symposium on Plasma ChemistryJuly 26 - 31,
2009, Bochum (Germany). |
|
L. Stafford, O. Boudreault, R. Khare, V.M. Donnelly,
Studies of oxygen and
chlorine atom recombination reactions on dynamic
surfaces using a rotating substrate technique,
17th International Colloquium on Plasma Processes, June
22-26, 2009, Marseille (France). |
|
L. Stafford, Étude des
interactions plasmas-surfaces du nano au macro,
Département de Physique, Université de Montréal, January
13th 2009, Montréal, Québec (Canada). |
|
M. Moisan, J. Pelletier,
Advances and drawbacks of microwave plasmas,
SVC (Society of Vacuum Coaters) TechCon, Santa Clara,
Californie, 11-12 mai 2009. |
|
M.
Moisan, J. Pelletier
Advances and drawbacks of microwave plasmas,
7th workshop on microwave discharges (MD-7) (Hamamatsu,
Japon) 22-27 septembre 2009. |
|
J. Margot, L. Stafford, J.S. Poirier, P.M. Bérubé, M.
Chaker, Modeling Etching
Plasmas: Needs and Challenges in Atomic and Molecular
Data, ICAMDATA2008, Oct.
2008, Beijing China. (Talk given by J. Margot) |
|
L. Stafford, Studies of
plasma reactions on dynamic surfaces using a novel
rotating substrate technique,
CAP / ACP Congress, June 8-11 2008, Québec (Canada). |
|
M. Moisan,
M.K. Boudam, D. Kéroack, J. Pollak, B. Saoudi
Caractérisation de l'inactivation de micro-organismes
par les photons UV/UVV émis par une décharge d'argon ou
dans une post-décharge de N2-O2:
fluence (dose), longueur d'onde des photons, dommage aux
matériaux,
colloque Plasma-Québec,
Montréal 22-23 mai 2008 |
|
L. Stafford, Défis de la
physique de l’interaction plasma-surface en micro et
nanofabrication,
Département de Physique, Université de Montréal, May 11th
2007, Montréal, Québec (Canada). |
|
M.
Moisan, K. Boudam, J. Pollak, B. Saoudi
UV based plasma sterilization in
an argon discharge and in an N2-O2
flowing afterglow: development of 3 different plasma
sterilizers,
International Conference on Plasma Medicine
(ICPM)-I, Corpus Christi, Texas, 15-18 octobre 2007. |
|
S.J. Pearton, W.T .Lim, J. Wright, R. Khanna, L.F.Voss,
L. Stafford, L.C. Tien, H.S. Kim, D.P. Norton, J.-J.
Chen, H.T. Wang, B.S. Kang, F. Ren, J. Jun, J. Lin,
Development of Thin Film
and Nanorod ZnO-Based LEDs and Sensors,
Mat. Res. Soc.
(MRS) Symp., Dec. 2006, Boston, Massachusetts. (Talk
given by S.J. Pearton) |
|
L. Stafford, R. Khanna, L.F. Voss, S.J. Pearton, F. Ren,
Novel thermally stable
contacts to GaN, 210th
Electrochem. Soc. Meeting, Oct. 29-Nov. 3 2006, Cancun
(Mexico). |
|
A.M. Dabiran, A. Osinsky, P.P. Chow, R.C. Fitch, N.
Moser, A. Crespo, T.J. Anderson, F. Ren, R. Khanna, L.
Stafford, S. J. Pearton,
GaN-based Devices for Reliable Operation at Very High
Temperatures, 210th
Electrochem. Soc. Meeting, Oct. 29-Nov.
3 2006, Cancun (Mexico), ECS Trans.
3(5), 349 (2006). (Talk given by A.M. Dabiran)
|
|
M.K.
Benhacene Boudam, C. Popovici, M. Moisan, B. Saoudi, N.
Gherardi, F. Massines
Bacterial spore inactivation by UV photons in
atmospheric pressure discharges,
18th ESCAMPIG, Lecce,
2006. |
|
L. Stafford, Mécanismes
fondamentaux et défis de la gravure par plasma,
École d’été du Regroupement Québécois Étudiant sur les
Matériaux de Pointe (RQEMP), August 2nd 2005,
Sherbrooke (Canada). |
|
M. Moisan
Plasma sterilization at reduced gas pressure: main
mechanisms and their relation to microorganism
inactivation efficiency and damage to materials,
Université Polytechnique, St-Peterbourg (Russie),
Intitut de mécanique théorique et appliquée,
Akademgorodok (Novosibirsk, Russie), Institut
pétrochimique et de synthèse, Moscou (Russie) août 2004. |
|
M. Moisan
Contraction and filamentation of surface-wave discharges
at atmospheric pressure: experiment and theory,
Université de Moscou (Russie) août 2004. |
|
M. Moisan
Plasma sterilization at reduced gas pressure: main
mechanisms and their relation to microorganism
inactivation efficiency and damage to materials,
17th
ESCAMPIG, Constanta (Roumanie), septembre 2004. |
|
M. Moisan
Destrucción de gases de effecto invernadero de origen
industrial,
Cordoba (Espagne) 2004. |
| M.
Sabsabi, B. Le Drogoff, M. Chaker, J. Margot, F. Vidal,
T.W. Johnston, S. Laville, O. Barthélemy,
Dependence of LIBS analysis of solid samples on the
laser pulse duration
EMSLIBS II (2nd
Euro-Mediterranean Symposium on Laser Induced Breakdown
Spectroscopy), Hersonissos, Greece, October 2003. |
|
B. Le
Drogoff, M. Chaker, M. Sabsabi, J. Margot, F. Vidal,
T.W. Johnston, S. Laville, O. Barthélemy,
From ultrashort to long pulse regime: role of the laser
pulse duration in Laser-Induced Plasma Spectroscopy
FACSS 2003 (30th Annual Meeting of the Federation of
Analytical Chemistry and Spectroscopy Societies), Ft.
Lauderdale (USA), October 2003. |
|
M. Moisan
Recent development in the application of microwave
discharges to sterilization of medical devices,
5th International workshop on microwave
discharges, Zinnowitz (Greifswald, Allemagne) (juillet
2003), Compte-rendu de la conférence (avec arbitrage),
12 pages. |
|
M. Moisan, J. Barbeau, K. Benhacene, M.C. Crevier, J.
Pelletier, N. Philip, B. Saoudi
La stérilisation d'objets médicaux au moyen d'un plasma
(gaz ionisé) : une alternative aux méthodes actuelles de
stérilisation,
71e Congrès de l’ACFAS, Université du Québec
à Rimouski, 2003. |
|
M. Moisan,
Y. Kabouzi, D. Kéroack, J.C. Rostaing, D. Guérin, C.
Larquet, A. El-Krid,
Abatement of greenhouse perfluorinated gases in
atmospheric-pressure surface-wave microwave plasmas,
4th
Int. workshop on fluorocarbon plasmas, Col de Porte
(Grenoble) (18-21 mars 2002). |
|
M. Moisan,
J. Barbeau, M.-C. Crevier, J. Pelletier, N. Philip, B.
Saoudi,
Plasma sterilization: methods and mechanisms,
15th
international symposium on plasma chemistry (ISPC-15),
Université d’Orléans (12 juillet 2001). |
|
M. Moisan,
J. Barbeau, J. Pelletier, N. Philip, B. Saoudi,
Plasma sterilization: mechanisms, potential and
shortcomings,
13th
Int. Coll. Plasma Processes (SFV), Antibes. Le
Vide :science, technique et applications, Numéro
spécial : Actes de Colloque (mai 2001), 12-18. |
|
J. Pelletier, M. Moisan
Stérilisation par plasma : bilan actuel des études
expérimentales et analyse des mécanismes d’inactivation,
Interactions Gaz-Surface dans les Procédés Chimiques en
Phase Vapeur, IGS 2001, Autrans, France (8-12 janvier
2001). |
|
M.
Moisan,
La stérilisation par plasma : méthodes et mécanismes,
Journée d’étude sur l’utilisation des plasmas froids
pour la stérilisation des instruments médicaux et des
emballages alimentaires, organisée par la Société
Française du Vide (SFV), Toulouse, Octobre 2000. |
|
Joëlle
Margot,
Studies of
emission spectra in plasmas from sub-mtorr to atmosphere
and local thermodynamic equilibrium: Fact or wishful
thinking ?,
International Conference on Plasma Physics/APS,
conférence conjointe, Québec, Octobre 2000 |
|
M. Moisan,
Y. Kabouzi, D. Kéroack, J. C. Rostaing, D. Guérin,
Microwave
plasma treatment of perfluorinated gases (PFCs),
Plasma Processing Science (Gordon Research Conference),
Tilton, New Hampshire, Etats-Unis, Août 2000 |
|
M. Moisan
Applications of surface-wave discharges,
52th Annual Gaseous Electronics Conference (American
Physical Society) Norfolk, Virginie, Octobre 1999 |
|
M. Moisan
Tratamiento de superficies mediante plasmas de alta
frecuencia mantenidos por ondas de superficie,
Jornadas SAM 98 - Iberomet V (14-18 septembre
1998, Rosario, Argentine)
|
|
Joëlle
Margot,
High-density plasma sources for materials processing,
Congrès de l’Association Canadienne des Physiciens,
Waterloo, Juin 1998 |
|
M. Moisan
Characteristics of surface-wave excited plasmas,
The 15th
symposium on plasma processing (21 au 23 janvier 1998,
Hamamatsu, Japon)
|
|
Joëlle
Margot,
Surface
waves: a tool for producing plasmas from sub-mtorr to
atmosphere,
50th Gaseous Electronics Conference, Madison
(Wisconsin), Octobre 1997. |
|
Joëlle
Margot,
High
frequency magnetoplasmas in electronegative gases,
International Conference Phenomena in Ionized Gases
XXIII, Toulouse (France), 17-22 Juillet 1997. |
|
Joëlle
Margot,
Physics of
surface-wave discharges,
NATO ASI on Plasma Processing of Semiconductors, Château
de Bonas (France), Juin-Juillet 1997
|
|
Joëlle
Margot,
Magnetized
surface-wave discharges for submicrometer pattern
transfer,
NATO ASI on Plasma Processing of Semiconductors, Château
de Bonas (France), Juin-Juillet 1997 |
|
M. Moisan,
J. C. Rostaing, F. Coeuret, R. Etemadi, P. Jones
Transformation of gases detrimental to the environment
using plasma at or close to atmospheric pressure,
Third international workshop on Microwave discharges,
fundamentals and applications, Abbaye royale de
Fontevraud (20-25 avril 1997) |
|
Joëlle
Margot,
Etching of
thin films using magnetised plasmas,
3rd International Workshop on Microwave Discharges:
Fundamentals and Applications, Abbaye de Fontevraud
(France), Avril 1997. |
|
M. Moisan,
J. C. Rostaing, F. Coeuret, R. Etemadi, P. Jones
Applications des plasmas à la destruction des effluents
gazeux,
Cinquième congrès de la section plasma de la Société
française de physique, Autrans (5-7 février 1997) |
|
M. Moisan
Surface-wave plasma sources: basic principles and
applications,
XVII CBRAVIC (Congresso brasileiro de aplicações de
vácuo na indústria e na ciência) (CNPq - Conselho
Nacional de desenvolvimiento cientifico), Universidade
Federal de Minas Gerais, Belo Horizonte, juillet 1996 |
|
M. Moisan,
C. M. Ferreira, J. Hubert, J. Margot, Z. Zakrzewski
Surface-wave sustained plasmas: toward a better
understanding of RF and microwave discharges,
XXIIth Conference on phenomena in ionized
gases (Int. union of pure and applied science, Int.
union of radio science), Hoboken, N. J., 1995 |
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